Low Temperature Plasma Coating

Ecosil designed and built a laboratory scale plasma deposition system for a client to apply a very thin layer of silicon to the surface of small metallic particles. This process is done under a vacuum, and uses a rotating process vessel to continuously expose solid particles to the plasma gas within the vessel. This design is a refinement of Ecosil’s previous design, and eliminates rotating seals used to maintain the vacuum. Because the system was designed to conduct process testing for development purposes, it is capable of operating at various conditions of power input to the plasma system, gas flow rate of coating element, rotational speed and direction of the agitation vessel, and processing time.

You are viewing the text version of this site.

To view the full version please install the Adobe Flash Player and ensure your web browser has JavaScript enabled.

Need help? check the requirements page.

Get Flash Player